发明名称 Filter apparatus, exposure apparatus, and device-producing method
摘要 A filter apparatus for improving gas temperature stability while maintaining a high impurity removal capacity. The filter apparatus includes a filter for removing impurities from a gas and a temperature adjuster for adjusting the temperature of the gas to a predetermined temperature. The filter apparatus further includes a humidity detector, arranged at the upstream side of the filter, for adjusting the humidity of the gas before the gas passes through the filter.
申请公布号 US7416574(B2) 申请公布日期 2008.08.26
申请号 US20050292491 申请日期 2005.12.02
申请人 NIKON CORPORATION 发明人 UDAGAWA KENJI;NAGAHASHI YOSHITOMO
分类号 A61G10/00;A61G11/00;A61G13/00;B01D46/00;B01D46/42;G03F7/20 主分类号 A61G10/00
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