| 摘要 |
A shape measurement apparatus for measuring the shape of the surface to be measured, an exposure device, a computer used in the apparatus, and a surface shape measurement apparatus are provided to obtain an interference signal of high contrast by the signal treatment. A shape measurement apparatus comprises an interferometer(10) which detects the interference light formed by the measurement light from the surface to be measured and the reference light from the reference surface by a photoelectric converter; and a computer(100) which Fourier-transforms the first interference signal detected by the photoelectric converter to obtain a phase distribution and an amplitude distribution, fixes the amplitude distribution, inverse-Fourier-transforms the corresponding phase distribution and the corresponding amplitude distribution to obtain a second interference signal, and determines the shape of the surface to be measured based on the second interference signal. |
