| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photo-curable resin composition which exhibits excellent curability by irradiation of ultraviolet rays or the like in a low irradiation doze and provides a coating film excellent in heat resistance, adhesiveness, hardness, dimensional stability, and the like. <P>SOLUTION: The photo-curable resin composition comprises 100 pts.wt. of a curable compound (C) and 0.01-20 pts.wt. of a cationic photopolymerization initiator (D), wherein the curable compound (C) comprises 10-90 wt.% of an alicyclic diepoxy compound represented by formula (1), wherein R<SP>1</SP>to R<SP>18</SP>each denote a hydrogen atom or the like, and 90-10 wt.% of at least one compound (B) selected from an epoxy compound (B1) except (A), an oxetane compound (B2), and the like. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
