发明名称 |
Extreme ultra violet light source apparatus |
摘要 |
An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
|
申请公布号 |
US2008197299(A1) |
申请公布日期 |
2008.08.21 |
申请号 |
US20080071352 |
申请日期 |
2008.02.20 |
申请人 |
HOSHINO HIDEO;ABE TAMOTSU;ENDO AKIRA |
发明人 |
HOSHINO HIDEO;ABE TAMOTSU;ENDO AKIRA |
分类号 |
G21K5/00 |
主分类号 |
G21K5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|