COMPOUND FOR PHOTOACID GENERATOR, RESIST COMPOSITION USING THE SAME, AND PATTERN-FORMING METHOD
摘要
<p>An onium sulfonate salt represented by the formula (1) below can be used as an excellent radiation-sensitive acid generator for resist compositions. A good pattern can be formed by using a resist composition containing the onium sulfonate salt. [chemical formula 64] In the formula (1), R<SUP>1</SUP> represents a monovalent organic group, and Q<SUP>+</SUP> represents a sulfonium cation or an iodonium cation.</p>
申请公布号
WO2008099869(A1)
申请公布日期
2008.08.21
申请号
WO2008JP52410
申请日期
2008.02.14
申请人
CENTRAL GLASS COMPANY, LIMITED;HAGIWARA, YUJI;JODRY, JONATHAN JOACHIM;NARIZUKA, SATORU;MAEDA, KAZUHIKO
发明人
HAGIWARA, YUJI;JODRY, JONATHAN JOACHIM;NARIZUKA, SATORU;MAEDA, KAZUHIKO
