| 摘要 |
A chemical vapor deposition apparatus for a flat display is provided to reduce its weight, to achieve a simple structure as being free from thermal deformation of an upper chamber, and to prepare a work plate strong against to heat in an upper part of the upper chamber, thereby enabling a worker to stably and easily perform a work such as maintenance in the upper part of the upper chamber. In a chamber, a deposition process for a glass substrate(G) for a flat display is performed. The chamber has upper and lower chambers(10,20). A support plate(50) is coupled in a central area of an upper plate unit(13) of the upper chamber, and supports a gas supply unit(15) for supplying process gas to the chamber. In an upper part of the upper plate unit of the upper chamber, a work plate(60) is spaced from the support plate so as to achieve access to the gas supply unit. The work plate is coupled with the upper plate unit so as to form an air gap between the work plate and the upper plate unit. |
