发明名称 |
MODIFIER FOR LOW DIELECTRIC CONSTANT FILM, AND METHOD FOR PRODUCTION THEREOF |
摘要 |
<p>Disclosed is a modifier for lowering the relative dielectric constant of a low dielectric constant film for use in a semiconductor device. Specifically disclosed is a modifier for a low dielectric constant film, which is characterized by comprising a silicon compound represented by the formula (1) as an active ingredient. R<SUB>3-n</SUB>H<SUB>n</SUB>SiN<SUB>3</SUB> (1) wherein R represents a C1-C4 alkyl group; and n represents an integer of 0 to 3.</p> |
申请公布号 |
WO2008099522(A1) |
申请公布日期 |
2008.08.21 |
申请号 |
WO2007JP63777 |
申请日期 |
2007.07.11 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED;OGAWA, TSUYOSHI;OHASHI, MITSUYA |
发明人 |
OGAWA, TSUYOSHI;OHASHI, MITSUYA |
分类号 |
H01L21/312;H01L21/768;H01L23/522 |
主分类号 |
H01L21/312 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|