发明名称 METHOD OF MANUFACTURING GaN-BASED LIGHT EMITTING DIODE ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a novel method of manufacturing a GaN-based light emitting diode element which includes a translucent substrate having an irregular surface. <P>SOLUTION: The method of manufacturing a GaN-based light emitting diode element has steps of (A) forming an epi-wafer by epitaxially growing a GaN-based semiconductor on the surface of the translucent substrate having cut grooves formed therein, (B) processing the substrate-side surface of the epi-wafer formed in the step (A) to have the irregular surface, and (C) separating the epi-wafer at positions of the cut grooves by an external force. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008192900(A) 申请公布日期 2008.08.21
申请号 JP20070026797 申请日期 2007.02.06
申请人 MITSUBISHI CHEMICALS CORP 发明人 KIN SEICHIN;TANIGUCHI KOICHI;NAKAI TERUHISA;KUDO HIROMITSU;OKAGAWA HIROAKI;HIRAOKA SUSUMU
分类号 H01L33/22;H01L33/32 主分类号 H01L33/22
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