发明名称 SUBSTRATE TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To judge whether or not a newly prepared treatment recipe can cope with an existing substrate treatment system and to utilize the treatment part of the existing substrate treatment unit as much as possible. SOLUTION: The substrate treatment system comprises: a recipe preparation means 100 for preparing a treatment recipe with a treatment parameter for drive-controlling the driving means of the treatment part in a treatment unit for executing treatment to a substrate to be treated and controlling the discharge of treatment liquid from a treatment liquid supply nozzle and the operation of a treatment liquid supply means or the like; a controller for drive-controlling the driving means, a treatment liquid supply nozzle moving mechanism and the treatment liquid supply means according to the treatment recipe; and an USB key 200 for storing the treatment recipe with a treatment parameter prepared separately from the treatment parameter constituting the treatment recipe prepared in the recipe preparation means. The treatment parameter stored in the USB key and the treatment recipe prepared in the recipe preparation means are compared and whether or not the treatment recipe stored in the USB key can be executed is judged. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008192943(A) 申请公布日期 2008.08.21
申请号 JP20070027524 申请日期 2007.02.07
申请人 TOKYO ELECTRON LTD 发明人 ARAKI SHINICHIRO
分类号 H01L21/027 主分类号 H01L21/027
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