| 摘要 |
PROBLEM TO BE SOLVED: To provide an interlayer insulating film which has a low dielectric constant used as the interlayer insulating film of an electronic device, and the like, and has superior mechanical strength, and further, has proper stability with the passage of time, and provide an interlayer insulating film for an electronic device whereto the insulating film is applied in the state of a coating liquid, and to provide an electronic device which has the insulating film as a layer-constituting layer. SOLUTION: The insulating film for semiconductor integrated circuit is one which contains the high-molecular compound, having as its structural unit the radical represented by formula (1): -R<SB>1</SB>-C≡C-C≡C-, where R<SB>1</SB>represents the squirrel-cage type structural radical. COPYRIGHT: (C)2008,JPO&INPIT
|
