发明名称 METHOD FOR HEAT-TREATING FILM SUBSTRATE AND AMORPHOUS RESIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a resin film having high dimensional stability without deteriorating planarity even when receiving rapid heating in an amorphous resin film having heat resistance. SOLUTION: A method for heat-treating a film substrate comprises carrying out a heat treatment while transporting the film. The film is a film composed of an amorphous resin having≥150 to≤350°C softening point. In the method for heat-treating the film substrate, the film is transported through a heat-treating part without contact therewith. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008189710(A) 申请公布日期 2008.08.21
申请号 JP20070022775 申请日期 2007.02.01
申请人 KONICA MINOLTA HOLDINGS INC 发明人 FUKUDA KAZUHIRO
分类号 C08J7/00;B29C71/02 主分类号 C08J7/00
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