发明名称 |
Method of Automatic Fluid Dispensing for Imprint Lithography Processes |
摘要 |
Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
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申请公布号 |
US2008199816(A1) |
申请公布日期 |
2008.08.21 |
申请号 |
US20070774710 |
申请日期 |
2007.07.09 |
申请人 |
THE UNIVERSITY OF TEXAS BOARD OF REGENTS |
发明人 |
CHOI BYUNG J.;SREENIVASAN S. V.;WILLSON C. GRANT;COLBURN MATTHEW;BAILEY TODD;EKERDT JOHN |
分类号 |
G03F7/00;H01L21/027;G03F7/16 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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