Method for transferring surface structures such as interference layers and holograms to glass, ceramic/metallic substrates, comprises applying flexible intermediate support layer to support film and then embossed sol, and producing a stack

摘要

The method for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to glass, ceramic or metallic substrates, comprises applying a flexible intermediate support layer to a support film as a release layer, applying an embossed sol with a surface structure to the support layer, producing a stack encompassing a binder layer and the surface structure, removing the support film, and thermally treating the work piece at 450[deg] C. In relief hologram, the structuring takes place via simpler or thixotropic embossing. The method for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to glass, ceramic or metallic substrates, comprises applying a flexible intermediate support layer to a support film as a release layer, applying an embossed sol with a surface structure to the intermediate support layer, producing a stack encompassing a binder layer and the surface structure, removing the support film, and thermally treating the work piece at 450[deg] C. In relief hologram, the structuring takes place via simpler or thixotropic embossing. In the production of the stack, the binder layer is applied on the substrate and dried and then the surface structuring is transferred to the binder layer, and a binding agent is directly applied on the surface structuring and subsequently transferred the stack on the substrate. The transfer of a hot substrate takes place in the thermally treated work piece. The substrate temperature is 150-450[deg] C. The binding agent consists of a nano-composite obtained through surface modification of colloidal inorganic particles and one or more silanes of Rx-Si-A4-x, where A represents hydroxyl groups or hydrolytically separable groups, excluded methoxy, R represents hydrolytically non-separable groups and x is 0, 1, 2 or 3. In the 50% of the material quantity of silane, x is >= 1. Under the condition of the sol-gel-process with an understoichiometric water quantity related to the available hydrolysable groups, if necessary further hydrolysis and condensation of nanocomposite-sols takes place under formation of the nanocomposite-sols.