| 摘要 |
PROBLEM TO BE SOLVED: To reduce, for example, the amount of remaining liquid, exposure of a substrate, in an immersed region out of the surfaces of a substrate-stage roof plate including a criterion member for instrumentation, without spoiling the precision of instrumentation by using the criterion member for instrumentation. SOLUTION: The exposure apparatus of this invention includes a projection optical system which projects exposure light onto a substrate through an original plate so that the substrate is exposed through liquid filled in a gap between the projection optical system and the substrate. The exposure apparatus includes a chuck for holding the substrate, a substrate stage which moves, and a roof plate prepared in the substrate stage and located in surroundings of the substrate, which is held by the chuck, and having an instrumentation criterion member. An oil immersion region, which touches liquid in the exposure of the substrate, out of the surfaces of the roof plate is coated with a coating film having liquid repellent property to the liquid, while a region of the surface other than the oil immersion region out of the surface of the instrumentation criterion member is not coated with the coating film. Or the surface of the roof plate other than the measurement region, which is exposed by exposure light for measurement by the exposure light, out of the surface of the instrumentation criterion member is coated with a coating film having liquid repellent property to a liquid. COPYRIGHT: (C)2008,JPO&INPIT
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