| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for removing resist which has an excellent resist stripping property and causes less damage to a semiconductor or a flat panel display material. SOLUTION: In the composition for removing resist, a resist stripping agent which comprises poly(cyanoalkyl) ethyleneamine is used. Therein, the poly(cyanoalkyl)ethyleneamine is preferably at least one selected from N,N'-bis(2-cyanoethyl)-ethylenediamine, N,N,N'-tris(2-cyanoethyl)ethylenediamine, N,N,N',N'-tetrakis(2-cyanoethyl)ethylenediamine, N,N'-bis(2-cyanoethyl)piperazine, N,N'-bis(2-cyanoethyl)-N''-(2-aminoethyl)piperazine, N,N',N'-tris(2-cyanoethyl)-N''-(2-aminoethyl)piperazine and the like. COPYRIGHT: (C)2008,JPO&INPIT |
