| 摘要 |
PROBLEM TO BE SOLVED: To measure a length of a sample pattern or the like precisely by using a length dimension measuring apparatus for irradiating and planarly scanning a sample which is disposed in a low-vacuum sample chamber, with an electron beam condensed thinly by a high-magnetic field, and detecting a secondary electron emitted therefrom to measure the length of the dimension of the sample. SOLUTION: The length dimension measuring apparatus comprises: a magnetic field type objective lens and a deflecting system for thinly condensing the electron beam in the high-magnetic field, and for irradiating and planarly scanning the sample disposed in the low-vacuum sample chamber; an orifice 6 having two or more steps and a possibly small diameter which is disposed at an area where a secondary electron orbit of the secondary electron emitted from the sample is narrowed by the high-magnetic field of the magnetic field type object lens, so as not to block the secondary electron; an electrode for applying a positive voltage for accelerating the secondary electron passing through the orifice having the two or more steps while rotating or an electrode applied with the positive voltage; and a secondary electron detector 4 with which the accelerated secondary electron collide, and which detects and amplifies it. COPYRIGHT: (C)2008,JPO&INPIT
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