| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method by which a pattern especially a planar pattern can be efficiently formed from at least either two dimensional or three dimensional pattern in a short period of time by simple equipment, causing extremely small mechanical deterioration in a master. SOLUTION: The pattern forming method lays the master having at least either two dimensional or three dimensional pattern and a pattern transferred material one on another, the pattern transferred material having at least a recording layer which undergoes a change in a state when irradiated with a light, and irradiates the pattern transferred material with light to transfer the pattern of the master to the recording layer. A mode where the pattern is planar or a mode where the master is light-transmissive and the pattern transferred material is irradiated with light via the master is preferable. COPYRIGHT: (C)2008,JPO&INPIT
|
