| 发明名称 |
METHOD AND INSTRUMENT FOR CHEMICAL DEFECT CHARACTERIZATION IN HIGH VACUUM |
| 摘要 |
A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment at a pressure of about 10<SUP>-7 </SUP>Torr to 10<SUP>-6 </SUP>Torr.
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| 申请公布号 |
US2008197277(A1) |
申请公布日期 |
2008.08.21 |
| 申请号 |
US20080032526 |
申请日期 |
2008.02.15 |
| 申请人 |
KLA-TENCOR CORPORATION |
发明人 |
NASSER-GHODSI MEHRAN;YU MING LUN;FRIEDMAN STUART;TOTH GABOR |
| 分类号 |
H01J40/00 |
主分类号 |
H01J40/00 |
| 代理机构 |
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