发明名称 |
Device And Method For Producing Resist Profiled Elements |
摘要 |
The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
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申请公布号 |
US2008197295(A1) |
申请公布日期 |
2008.08.21 |
申请号 |
US20050599659 |
申请日期 |
2005.03.30 |
申请人 |
VISTEC ELECTRON BEAM GMBH |
发明人 |
KAULE WITTICH;PLONTKE RAINER;STOLLBERG INES;SCHUBERT ANDREAS;DICHTL MARIUS |
分类号 |
G21K5/04;G03F7/00;G03F7/20;G03H5/00;G11B7/007;H01J37/302;H01J37/317 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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