LOCALIZED LINEAR MICROWAVE SOURCE ARRAY PUMPING TO CONTROL LOCALIZED PARTIAL PRESSURE IN FLAT AND 3 DIMENSIONAL PECVD COATINGS

摘要

A system and method for controlling deposition of thin films on substrates. One embodiment includes a vacuum chamber; a plurality of sources located inside the vacuum chamber; and a plurality of gas tubes, each of the plurality of gas tubes comprising a first volume for delivering precursor gas and a second volume for providing pumping.