HAFNIUM COMPOUND, HAFNIUM THIN FILM-FORMING MATERIAL AND METHOD FOR FORMING HAFNIUM THIN FILM

摘要

A novel hafnium-based compound is provided to be a liquid at room temperature and show high stability, thereby forming a high quality hafnium-based thin film with stability. A hafnium thin film forming material is a hafnium-based compound represented by a formula(1) of LHf(NR^1R^2)3, wherein L is cyclopentadienyl group or substituted cyclopentadienyl group, and each R^1 and R^2 is alkyl, provided that R^1 and R^2 may be the same or different from each other. To form a hafnium thin film through a chemical vapor phase growth technique or an atomic layer controlled growth technique, the hafnium-based compound is used.