发明名称 SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To easily observe a defect detected by an inspection. SOLUTION: An inspection table 5 supports two opposite sides of a rectangular substrate 1. A light emitting system moves a light beam in the direction perpendicular to two supported sides of the substrate 1, and scans the light beam on the substrate 1 as the light beam is obliquely irradiated to a surface of the substrate 1. A defect detection circuit 25 detects the defect on the surface of the substrate 1 based on a scattering light received by an upper light receiving system 20. A CPU 60 detects a position on the surface of the substrate 1 irradiated with the light beam, detects a position of the defect detected by the defect detection circuit 25 on the surface of the substrate 1, and converts a coordinate of the position of the defect on the surface of the substrate 1 into a coordinate of the position projected onto a horizontal plane. An observation system movement control circuit 83 controls an observation system movement mechanism 82 by using the coordinate of the position converted by the CPU 60. The observation system movement mechanism 82 moves an observation system 80 above the defect detected by the defect detection circuit 25. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008191020(A) 申请公布日期 2008.08.21
申请号 JP20070026331 申请日期 2007.02.06
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIMODA YUICHI
分类号 G01N21/956;G01M11/00;H05K3/00 主分类号 G01N21/956
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