发明名称 Method of forming two-dimensional pattern by using nanospheres
摘要 The present invention relates to a method of forming a two-dimensional pattern, which includes: dispersing a plurality of spheres on a substrate; using the spheres to form a mask on the substrate; etching the substrate; and removing the mask from the substrate. In addition, the present invention further relates to a method of processing a surface of a substrate, which includes: dispersing a plurality of spheres on the surface of the substrate; depositing a substance among the spheres; and removing the spheres to leave the deposited substance on the surface of the substrate. The method of the present invention achieves a quicker and simpler process with a lower cost. In addition, a light emitting device manufactured through the method of the present invention has preferred light extraction efficiency and a variable radiation field pattern.
申请公布号 US2008199653(A1) 申请公布日期 2008.08.21
申请号 US20070897194 申请日期 2007.08.28
申请人 HONG KONG APPLIED SCIENCE AND TECHNOLOGY RESEARCHINSTITUTE CO. LTD. 发明人 KUO HAO-CHUNG;TONG SHI WUN;CHU HUNG-SHEN;CAI YONG
分类号 B32B5/00;H01L21/00 主分类号 B32B5/00
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