发明名称 FLUID DISPENSE SYSTEM
摘要 A system and method for dispensing fluid onto a surface during a manufacturing process. A fluid storage container holds a chemical, such as resist, used in a semiconductor lithography process. When not dispensing the chemical over the surface of a wafer, a pump and nozzle dispense the chemical into a dedicated dispense receptacle. A drain and pump may return the contents of the dispense receptacle to the fluid storage container for reuse.
申请公布号 US2008199596(A1) 申请公布日期 2008.08.21
申请号 US20070677240 申请日期 2007.02.21
申请人 TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC. 发明人 NAKAGAWA SEIJI
分类号 B05D1/02 主分类号 B05D1/02
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