METHOD AND STRUCTURE FOR MANUFACTURING POROUS LOW-PERMITTIVITY LAYER, INTERCONNECTION PROCESSING METHOD, AND INTERCONNECTION STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a porous low-permittivity layer.

SOLUTION: A CVD process is introduced to a substrate to which a frame precursor and a porogen precursor are supplied. In the supply stop period of the frame precursor, the value of at least one deposition parameter which is negatively correlated with the density of a product of the CVD process decreases.

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