| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and manufacturing method for a developer carrier, by which the need for an original is eliminated, the reproducibility of original data is high, damages to a resist is less, and satisfactory adherence to the resist is made secure. <P>SOLUTION: In the manufacturing apparatus for the developer carrier, a base substrate is held by a rotating means, the surface of the base substrate is coated with a photosensitive agent while being rotated, a photosensitive layer is formed; and the photosensitive layer is exposed by each minute regions; thereby a pattern is formed on the surface of the base substrate; and after the pattern is developed, surface processing is performed, the developer carrier is manufactured. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
