COMPOSITION FOR UNDER-RESIST FILM FORMATION AND UNDER-RESIST FILM FORMED FROM THE SAME

摘要

A composition for under-resist film formation which can form an under-resist film functioning as an antireflection film and having satisfactory adhesion to resist layers. Also provided is an under-resist film formed from the composition. The composition for under-resist film formation comprises a siloxane polymer (A) and a siloxane polymer (B) each having specific repeating units. This composition can form an under-resist layer which functions as an antireflection film and has satisfactory adhesion to resist layers.