| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a means for facilitating the specification of a position when an alignment mark is detected. <P>SOLUTION: The alignment mark is provided with a silicon substrate, a recessed part formed at the front surface of the silicon substrate, an epitaxial layer formed apart from the corner part of the recessed part between the front surface of the silicon substrate, an oxide film formed on the inner face of the recessed part and on the front surface of the silicon substrate up to the epitaxial layer, and a polycrystalline silicon layer formed on the oxide film. <P>COPYRIGHT: (C)2008,JPO&INPIT |
