| 发明名称 |
Recognition Device and Alignment System |
| 摘要 |
Embodiments of the present invention provide a recognition device and an alignment system. The recognition device is configured to recognize an alignment mark on a display substrate and comprises a camera unit and a light source unit. The camera unit is configured to shoot the alignment mark, and the light source unit is configured to radiate emitted light onto the alignment mark. The recognition device further comprises a light processing unit configured to process light emitted from the light source unit so that the luminance of the light irradiated onto the alignment mark is greater than that of the light emitted from the light source unit. Through the arrangement of the light processing unit, the recognition device enables the luminance of the light irradiated onto the alignment mark to be greater than that of the light emitted from the light source unit. |
| 申请公布号 |
US2016203378(A1) |
申请公布日期 |
2016.07.14 |
| 申请号 |
US201514744585 |
申请日期 |
2015.06.19 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
WANG Wenhao;HONG Yanping;RUAN Defa;ZHANG Chao;YU Peng;ZHOU Taoqing |
| 分类号 |
G06K9/20;H04N5/225;G06K9/00;H04N5/232 |
主分类号 |
G06K9/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A recognition device, configured to recognize an alignment mark on a display substrate and comprising a camera unit and a light source unit, the camera unit being configured to shoot the alignment mark, the light source unit being configured to radiate emitted light onto the alignment mark, wherein the recognition device further comprises a light processing unit configured to process light emitted from the light source unit so that the luminance of the light irradiated onto the alignment mark is greater than that of the light emitted from the light source unit. |
| 地址 |
Beijing CN |
