发明名称 SYSTEMS AND METHOD FOR OPTIMIZATION OF LAZER BEAM SPATIAL INTENSITY PROFILE
摘要 <p>A thin beam directional crystallization system configured to process a substrate comprises a laser configured to produce laser light, the laser configured to have a high energy mode and a low energy mode. The high energy mode is configured to produce light energy sufficient to completely melt a substrate coated with amorphous silicon film, while the low energy mode is configured to produce light energy that is not sufficient to completely melt a substrate coated with amorphous silicon film. The system further comprises beam shaping optics coupled to the laser and configured to convert the laser light emitted from the laser into a long thin beam with a short axis and a long axis, a stage configured to support the substrate and film, and a translator coupled with the stage, the translator configured to advance the substrate and film so as to produce a step size in conjunction with the firing of the laser.</p>
申请公布号 WO2008100708(A2) 申请公布日期 2008.08.21
申请号 WO2008US52494 申请日期 2008.01.30
申请人 TCZ PTE. LTD.;TURK, BRANDON, A.;KNOWLES, DAVID, S. 发明人 TURK, BRANDON, A.;KNOWLES, DAVID, S.
分类号 B23K26/00 主分类号 B23K26/00
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