| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for removing deposits which can electrically neutralize particles under easy-to-remove posture and can remove particles efficiently. SOLUTION: The device includes a tilt mechanism (rotation/tilt mechanism 14) for holding a substrate (wafer 10) and directing the extending direction of the substrate in the gravity direction, and a mechanism 20 for electrically neutralizing the deposits on the surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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