发明名称 ELECTRO-OPTICAL DEVICE SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 An electro-optical device that includes a transistor and an insulating film over the semiconductor layer of the transistor. The insulating film has an opening portion that overlaps the channel region. The gate electrode of the transistor includes a body portion arranged in the opening portion of the insulating film and an elongated portion that extends onto the insulating film so as to cover the second junction portion of the transistor. The second junction region is located in an intersection region of a non-aperture region of the display pixel.
申请公布号 US2008197355(A1) 申请公布日期 2008.08.21
申请号 US20080031035 申请日期 2008.02.14
申请人 SEIKO EPSON CORPORATION 发明人 ISHII TATSUYA;MORIWAKI MINORU
分类号 G02F1/1368;G09F9/30;H01L21/02;H01L21/336;H01L29/417;H01L29/423;H01L29/49;H01L29/786 主分类号 G02F1/1368
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