发明名称 ADDITIVE FOR POLISHING CONSTITUENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an additive for polishing constituent, which achieves stabilized polishing characteristics. <P>SOLUTION: The additive for polishing constituent contains one or more kinds of amine compound, and alcohol, and the amine compound contains a quaternary ammonium salt. In particular, when an amine compound is contained in high concentration, deposition of amine compound is suppressed by containing alcohol. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008192656(A) 申请公布日期 2008.08.21
申请号 JP20070022441 申请日期 2007.01.31
申请人 NITTA HAAS INC 发明人 TERAMOTO TADASHI;YAMADA RIYOUKO;MAKINO HIROSHI
分类号 H01L21/304;B24B37/00;C09K3/14 主分类号 H01L21/304
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