| 摘要 |
An exposure apparatus having a stage configured to hold a substrate and to be moved, and a projection optical system configured to project light from a reticle to the substrate held by the stage, and exposing the substrate to light via liquid filled in a gap between the substrate and a final surface of the projection optical system is disclosed. The apparatus comprises a first nozzle configured to supply liquid to the gap; a second nozzle configured to selectively perform recovery of liquid from the gap and supply of liquid to a gap between the stage and the final surface of the projection optical system; and a third nozzle configured to recover liquid supplied via at least the second nozzle.
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