发明名称 |
Barrier layer creating process for microstructured component involves preparing component in plasma reactor, plasma treatment, and supplying precursor and carrier gas |
摘要 |
<p>The barrier layer creating process consists of preparing the component in a plasma reactor with steam doser and gas supply; plasma treating the component in the region to be coated with a plasma from inert carrier gas to activate it, then supplying a steam or gas precursor to the carrier gas by steam dosing, gas exchanging back to inert carrier gas, and repeating the process several times.</p> |
申请公布号 |
DE102008007588(A1) |
申请公布日期 |
2008.08.21 |
申请号 |
DE20081007588 |
申请日期 |
2008.01.31 |
申请人 |
SENTECH INSTRUMENTS GMBH |
发明人 |
WANDEL, KLAUS;ARENS, MICHAEL;BESCH, WILFRIED;BOEFFEL, CHRISTINE;FOEST, RUEDIGER;OHL, ANDREAS;STEFFEN, HARTMUT;WOLF, RAINER |
分类号 |
H01L21/56;C23C16/18;C23C16/455 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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