发明名称 Barrier layer creating process for microstructured component involves preparing component in plasma reactor, plasma treatment, and supplying precursor and carrier gas
摘要 <p>The barrier layer creating process consists of preparing the component in a plasma reactor with steam doser and gas supply; plasma treating the component in the region to be coated with a plasma from inert carrier gas to activate it, then supplying a steam or gas precursor to the carrier gas by steam dosing, gas exchanging back to inert carrier gas, and repeating the process several times.</p>
申请公布号 DE102008007588(A1) 申请公布日期 2008.08.21
申请号 DE20081007588 申请日期 2008.01.31
申请人 SENTECH INSTRUMENTS GMBH 发明人 WANDEL, KLAUS;ARENS, MICHAEL;BESCH, WILFRIED;BOEFFEL, CHRISTINE;FOEST, RUEDIGER;OHL, ANDREAS;STEFFEN, HARTMUT;WOLF, RAINER
分类号 H01L21/56;C23C16/18;C23C16/455 主分类号 H01L21/56
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