| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid sealing unit and an immersion photolithographic apparatus having the same. <P>SOLUTION: The liquid sealing unit includes a storage vessel that contains a liquid and has an optical nozzle hole through which light can be transmitted, and a sealing part for containing a fluid, in contact with the liquid contained in the optical nozzle hole. An immersion photolithographic apparatus that has the liquid sealing unit is also provided. Hence, contamination of an immersion projection optical system can be prevented. <P>COPYRIGHT: (C)2008,JPO&INPIT |
