| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light source for exposure which achieves exposure according to a resist layer and has a long product lifetime, and to provide an exposure apparatus that uses the same. <P>SOLUTION: The light source 10 for exposure includes at least two or more kinds of lamp units 20 (20a, 20b, 20c,...) respectively, having lamps 24 different in the internal pressure, and a lamp holder 22 holding the lamp units 20 (20a, 20b, 20c,...). Since the light source for exposure includes at layer the two or more kinds of the lamp units 20 (20a, 20b,20c,...) respectively provided with lamps 24 that differ in the internal pressure, the lamp units 20 (20a, 20b,20c,....) optimal for exposing an exposure object X can be made selectively to emit light. <P>COPYRIGHT: (C)2008,JPO&INPIT |
