| 发明名称 |
CONTAMINATION ANALYSIS UNIT AND METHOD THEREOF, AND RETICLE CLEANING SYSTEM |
| 摘要 |
A contamination analysis unit and method for inspecting pollutants remaining on a target side of an inspection object such as a reticle after cleaning the object is provided. After steeping the target side in a solution, a sampling liquid may be abstracted therefrom after a predetermined time and may be analyzed.
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| 申请公布号 |
US2008196515(A1) |
申请公布日期 |
2008.08.21 |
| 申请号 |
US20080031086 |
申请日期 |
2008.02.14 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE OK-SUN;CHOI HYUNG-SEOK;AHN YO-HAN;KIM JI-YOUNG |
| 分类号 |
G01N1/14;G01N1/00;G01N1/10;G03F1/84 |
主分类号 |
G01N1/14 |
| 代理机构 |
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