Wafer sample characterization system for measuring e.g. stress of patterned or unpatterned wafer and wafer pattern has coherent light source that generates beam toward sample and detection system that receives reflected beam pattern

摘要

A sample holder positions a sample (110) to be characterized. A coherent light source (120) generates a beam pattern directed toward a region of the sample. A detection system (115) receives a reflected beam (112) pattern from the sample. The reflected beam sample is used to determine one or more surface characteristics of the region of the sample. The beam pattern is generated by transmitting the light through a diffraction grating or a phase hologram. Optical elements may position, scale, and image the beam pattern at the sample surface. Independent claims are included for (1) article; (2) method of sample characterization.