| 摘要 |
PROBLEM TO BE SOLVED: To provide a particle optical device, such as an ESEM(R), for observing samples simultaneously using particles and photons and reducing the scattering of particle beams at high pressure. SOLUTION: A pressure limiting aperture (PLA) is placed in a diaphragm between an objective lens in the ESEM (R) and a sample position. The distance between the sample position and the aperture is sufficiently small to allow a large collection angle of the photons through this aperture. A mirror is provided between the diaphragm and the objective lens. Due to the large collection angle for photons, a large NA is achieved. The small distance between the sample position and aperture also results in less scattering of electrons than occurs in the ESEM(R) where a mirror is placed between the aperture and sample position since the electrons have to travel through only a limited length in a high pressure area. Embodiments also include combinations where, for example, an immersion lens is used. COPYRIGHT: (C)2008,JPO&INPIT
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