| 发明名称 |
Resist composition and pattern forming method using the same |
| 摘要 |
<p>A resist composition includes: (A) a resin containing a repeating unit having a specific secondary benzyl structure; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.</p> |
| 申请公布号 |
EP1959300(A1) |
申请公布日期 |
2008.08.20 |
| 申请号 |
EP20080002527 |
申请日期 |
2008.02.12 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
MAKINO, MASAOMI;HOSHINO, WATARU;MIZUTANI, KAZUYOSHI |
| 分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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