LASER ANNEALING APPARATUS AND METHOD FOR MANUFACTURING DISPLAY APPARATUS USING THE SAME

摘要

The present invention provides a laser annealing device capable of forming a polycrystalline silicon layer with a high quality by emitting uniform laser beams, and a display device manufacturing method using the same. The laser annealing device includes: a chamber having a board inlet on one side, and a window through which the laser beams are penetrated on the top; a stage positioned inside the chamber, mounted with a board having an amorphous silicon layer, and moving inside the chamber to change a position of the board; a stabilization chamber arranged to penetrate the laser beams penetrated through the window before reaching the board on the stage and having an opening through which the laser beams can penetrate toward a stage; a nozzle positioned near the opening of the stabilization chamber and emitting a nitrogen gas; a first supply pipe of which one end is connected to the nozzle; a middle tank of which one side is connected to the other end of the first supply pipe; and a second supply pipe connected to the other side of the middle tank. A part where the first supply pipe and the middle tank are connected, and a part where the second supply pipe and the middle tank are connected do not face each other.