IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

摘要

Provided is an imprint apparatus that forms a pattern in an imprint material on a shot region of a substrate by using a mold. The apparatus comprises: a stage that can move while holding the substrate; and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.