PROCESSING GAS SUPPLIER OF SEMICONDUCTOR DEVICE MANUFACTURING EQUIPMENT AND PROCESSING GAS SUPPLING METHOD THEREOF

摘要

A processing gas supplier of a semiconductor device manufacturing apparatus and a processing gas supplying method thereof are provided to measure the amount of process gas in real time by forming a sensor at a process gas injection nozzle. A gas ring main body having a ring-shaped structure is installed around an electrostatic chuck of an inside of a process chamber. A plurality of process gas injection nozzles(216) are formed at an inner surface of the gas ring main body to supply a process gas to the inside of the process chamber. A sensor(218) is formed at the process gas injection nozzle to measure the flow amount of process gas injected from the process gas injection nozzles. The sensor is formed at an end of the process gas injection nozzle.