| 摘要 |
The present invention relates to naphthalenetetracarboxylic acid derivatives of the general formula (I) in which at least one of the radicals R1, R2, R3 and R4 stands for a substituent selected from Br, F and CN, and the remaining radicals stand for hydrogen; Y1 stands for O or NRa, with Ra standing for hydrogen or an organyl radical; Y2 stands for O or NRb, with Rb standing for hydrogen or an organyl radical; Z1 and Z2 independently of one another stand for O or NRc, with Rc standing for an organyl radical; and Z3 and Z4 independently of one another stand for O or NRd, with Rd standing for an organyl radical; to a process for preparing them and to their use, more particularly as n-type semiconductors. |
