发明名称 |
Method for structuring a layer onto a substrate |
摘要 |
<p>The method involves providing an arrangement with a substrate (1) and a polymer layer (2) made of polymer and additive, and covering selected areas of the layer by a radiation mask (3). The arrangement is charged with ultraviolet radiation, where dosage of the radiation is selected, such that the radiation modifies a surface-near layer (21) and the mask. The mask is removed from the arrangement. The arrangement is treated with a solvent, which does not dissolve the substrate. The part of the layer is partially dissolved by the solvent, which is used as a flushing medium.</p> |
申请公布号 |
EP1959298(A2) |
申请公布日期 |
2008.08.20 |
申请号 |
EP20080002496 |
申请日期 |
2008.02.12 |
申请人 |
KARLSRUHER INSTITUT FUER TECHNOLOGIE |
发明人 |
SCHIMMEL, THOMAS PROF. DR.;PANCERA-MONTERO, SABRINA DR.;GLIEMANN, HARTMUT DR. |
分类号 |
G03F7/00;B01L3/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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