LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus and a device manufacturing method are provided to improve robustness of iterative learning control systems on set point variations. A lithographic apparatus includes a processing device which determines a feed forward transfer function of a control system. The processing device, which learns repeatedly an output signal(fff) of the control system using iterative learning control on a predetermined set point signal(r) and determines a relation between the learned feed forward output signal and the predetermined set point signal, includes program instructions for applying the relation as the feed forward transfer function of the control system.