Lithographic apparatus and device manufacturing method
摘要
<p>A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.</p>
申请公布号
EP1821150(B1)
申请公布日期
2008.08.20
申请号
EP20070007495
申请日期
2005.12.01
申请人
ASML NETHERLANDS B.V.
发明人
HENNUS, PIETER RENAAT MARIA;MERTENS, JEROEN JOHANNES SOPHIA MARIA;SMULDERS, PATRICK JOHANNES CORNELUS HENDRICK;SMITS, PETER
