| 摘要 |
<p>An exposure apparatus and a method for forming a semiconductor device using the same are provided to improve polarization efficiency in an exposure process by using a Brewster angle. An exposure apparatus includes a light source unit(100), an exposure mask(140), and a polarizing substrate(130). The polarizing substrate is obliquely formed at a predetermined angle in a region between the light source unit and the exposure mask. The polarizing substrate is a transparent substrate made of quartz. An incident ray irradiated from the light source unit to the polarizing substrate is 40 to 80 degrees. The polarizing substrate is coated with a material having a high refractive index.</p> |
