Gas reaction system and semiconductor processing apparatus

摘要

A gas reaction system is disclosed which comprises a vaporizer ( 230 ) for generating a reaction gas by vaporizing a liquid material and a reaction chamber ( 221 A) wherein the reaction gas is reacted. The vaporizer ( 230 ) is integrally formed with a component member which defines the reaction chamber ( 221 A). The reaction gas generated in the vaporizer ( 230 ) is directly introduced into the reaction chamber ( 221 A). The vaporization chamber ( 232 ) of the vaporizer ( 230 ) is a space between an upper plate ( 230 A) and a cap ( 230 B) attached to the upper surface of the upper plate ( 230 A). A narrow passage ( 233 ) is formed between the cap ( 230 B) and the upper plate ( 230 A) which passage ( 233 ) communicates with the vaporization chamber ( 232 ).